Semiconductor Chemicals

Process chemicals are critical to the semiconductor manufacturing process, as they are used to clean, etch, and deposit materials onto the surface of the semiconductor wafer. Each stage of the manufacturing process requires a specific set of chemicals, with varying degrees of purity and concentration, to achieve the desired results.

Cleaning chemicals, for instance, are used to remove impurities and contaminants from the wafer's surface before any fabrication can take place. These chemicals are typically composed of acids, bases, or solvents and can include hydrofluoric acid (HF), ammonium hydroxide (NH₄OH), and hydrogen peroxide (H2O₂).

Etching chemicals, on the other hand, are used to remove specific layers from the surface of the wafer to create patterns or structures. Etching can be either a wet or dry process and utilizes chemicals such as hydrochloric acid (HCl), nitric acid (HNO₃), and sulfuric acid (H2SO₄).

Deposition chemicals are used to add new layers of material to the wafer, and can include metal films, dielectric materials, and semiconductors. Chemical vapor deposition (CVD) and physical vapor deposition (PVD) are two common deposition techniques used in the semiconductor industry, which require different sets of chemicals.

Photoresist chemicals are used in photolithography processes to transfer patterns onto the wafer, and planarization chemicals, which are used to flatten the wafer's surface and improve yield.

The specific set of process chemicals used in semiconductor manufacturing will depend on the exact fabrication process and the materials being used. Some of the most commonly used process chemicals in semiconductor manufacturing include:

Hydrofluoric acid (HF)
Ammonium hydroxide (NH₄OH)
Hydrogen peroxide (H2O₂)
Hydrochloric acid (HCl)
Nitric acid (HNO₃)
Sulfuric acid (H₂SO₄)
Silicon tetrachloride (SiCl₄)
Titanium tetrachloride (TiCl₄)
Phosphine (PH₃)
Arsine (AsH₃)
Boron trichloride (BCl₃)
Trimethyl aluminum (TMA)
Tungsten hexafluoride (WF₆)
Silane (SiH₄)
Dichlorosilane (SiH₂C₁₂)

Other chemicals and compounds used during the semiconductor manufacturing process include: