FABS


Semiconductor Fabs


Semiconductor fabrication plants (fabs) are among the most complex industrial facilities ever built. They house the cleanrooms, wafer fab equipment, and supporting subsystems needed to manufacture integrated circuits at scales ranging from legacy nodes (130 nm+) to cutting-edge logic at 3 nm and below. A single leading-edge fab can cost $20+ billion to construct and equip, and will consume massive amounts of power, water, and specialty gases. Fabs represent both a national security asset and a critical bottleneck in the semiconductor supply chain.


Fab Resource Consumption

Resource Typical Consumption (Leading-Edge Fab) Notes
Power 100–200 MW per fab module; 400 MW–1 GW+ for multi-fab campuses TSMC Fab 18 (Taiwan) and Samsung Pyeongtaek (Korea) are multi-hundred MW to GW-class consumers.
Ultrapure Water (UPW) 10–20 million gallons/day Onsite purification plants recycle >70% in advanced fabs.
Process Gases* Thousands of tons/year Includes nitrogen, argon, hydrogen, helium, and specialty gases (CF4, NF3, etc.).
Chemicals Hundreds of thousands of liters/day Acids, bases, photoresists, CMP slurries; hazardous waste handling critical.
Workforce 1,000–3,000 employees Varies by fab size and degree of automation.

* 1.2 million m3 of nitrogen, 36,000 m3 of hydrogen, 7,2000 m3 of oxygen, 6,000 m3 of argon, 4,800 m3 of carbon dioxide, and 1,200 m3 of helium daily.


Mega-Fab Power & Water Footprint

While individual fab modules typically consume 200 MW of power and 10 million gallons of water per day, modern giga-campuses with multiple fabs and support facilities now operate at an entirely different scale. These sites rival or exceed small cities in utility demand, making power and water availability a first-order constraint in site selection and national policy. The largest fabs today approach the 1 GW class in power draw and require tens of millions of gallons of ultrapure water (UPW) daily.

Fab Complex Location Power Demand Water Demand Notes
TSMC Fab 18 Tainan, Taiwan ~600 MW (multi-phase) ~30M gallons/day Flagship 5 nm and 3 nm “GigaFab,” expanding toward 2 nm.
Samsung Pyeongtaek Campus Gyeonggi Province, South Korea ~1 GW+ 30M+ gallons/day World’s largest fab complex; DRAM and logic production.
TSMC Arizona (Fab 21) Phoenix, Arizona, USA ~400–600 MW (two modules) ~10–15M gallons/day U.S. CHIPS Act showcase fab; 4 nm + 3 nm lines, ramping late 2020s.
Samsung Taylor Texas, USA ~400–500 MW (initial) ~10–20M gallons/day Expected to become one of the largest U.S. fabs; multi-node expansion possible.
Intel Ocotillo Chandler, Arizona, USA ~400–500 MW ~15M gallons/day Multiple fabs including advanced-node logic and R&D lines.

Key Takeaways

  • Utility Scale: The largest fabs now operate at power and water demands equivalent to mid-sized cities.
  • Grid Dependence: Sites require dedicated high-voltage substations and often multi-GW grid interconnects.
  • Water Recycling: Advanced fabs recycle up to 80–90% of water to mitigate scarcity risks.
  • Energy Autonomy: Growing push for on-site renewables, microgrids, and energy storage to stabilize supply.

Fab Hub Cities

Region Hub Cities Key Operators
United States Phoenix (AZ), Dallas (TX), Austin (TX), Albany (NY), Portland (OR) Intel, TSMC, Samsung, GlobalFoundries, Micron
Taiwan Hsinchu, Tainan, Taichung TSMC, UMC
South Korea Hwaseong, Pyeongtaek, Icheon Samsung, SK hynix
Japan Kumamoto, Hiroshima, Ibaraki Renesas, Sony, Rapidus, TSMC-Japan
Europe Dresden (Germany), Crolles (France), Leixlip (Ireland) Infineon, STMicro, Intel
China Shanghai, Wuxi, Wuhan, Shenzhen SMIC, Hua Hong, YMTC

Major Fabs Worldwide

The title for the most semiconductor fabrication facilities in the world belongs to Taiwan Semiconductor Manufacturing Company (TSMC) with headquarters in Taiwan.

Fab Quantity Host Country
ABB 2 Europe
AKM Semiconductor, Inc. 5 Japan
ams 1 EU
Analog Devices 5 USA
Apple 1 USA
APT Electronics 1 China
Aqualite 2 China
Arima Optoelectronics 1 Taiwan
ASMC 2 China
Atomica 1 USA
AWSC 1 Taiwan
BAE Systems 1 USA
Beiling 1 China
Bosch 3 Germany
Broadcom 1 USA
Canon Inc. 3 Japan
CanSemi 1 China
CEITEC 1 Brazil
Changxin Memory Technologies 1 China
Creative Sensor Inc 3 China
Cree 2 USA
CRMicro 5 China
CST Global Ltd 1 Scotland
DB HiTek 1 S. Korea
Denso 1 Japan
Diodes Incorporated 4 global
DongbuHiTek 3 S. Korea
Elmos Semiconductor 1 Germany
EM Microelectronic 1 Switzerland
Entrepix 1 USA
Episil Semiconductor 2 Taiwan
Epistar 12 Taiwan
Epson 2 Japan
Everlight 3 China
Flir Systems 1 USA
Fuji Electric 4 Japan
Fujitsu 7 Japan
GCS 1 USA
General Motors 1 USA
GlobalFoundries 10 USA
Hanking Electronics 1 China
Hitachi 3 Japan
HTE Labs 1 USA
Hua Hong Semiconductor 6 China
INEX Microtechnology 1 UK
Infineon Technologies 22 Germany
Infinera 1 USA
Innovative Ion Implant 2 USA
Integrated Device Technology 1 USA
Intel 20 USA
ISRO 1 India
IXYS 4 USA
Japan Semiconductor 2 Japan
Kioxia 13 Japan
Kyocera 2 global
LG Innotek 1 S. Korea
Lite-On Optoelectronics 8 China
Macronix 2 Taiwan
Medtronic 1 USA
Microchip 3 USA
Micron 15 USA
MIMOS Semiconductor 1 Malaysia
Mirrorcle Technologies 1 USA
Mitsubishi Electric 3 Japan
Mitsumi Electric 2 Japan
Murata Manufacturing 7 Japan
nanoPHAB 1 Netherlands
Nanya 3 Taiwan
NEC 2 Japan
New Japan Radio 5 Japan
Newport Wafer 1 UK
Nexchip 4 China
Nexperia 2 EU
NHanced Semiconductors 1 USA
Nichia 2 Japan
Nuvoton 2 Taiwan
NXP Semiconductors 8 global
Oki Electric 5 Japan
Olympus 2 Japan
ON Semiconductor 10 USA
Optotech 2 global
Orbit Semiconductor 1 USA
Osram 3 global
Polar Semiconductor 4 Taiwan
PragmatIC Semiconductor 2 UK
Qorvo 3 USA
Raytheon 1 UK
Renesas 10 Japan
Rigetti Computing 1 USA
Rogue Valley Microdevices 1 USA
Rohm 15 Japan
Samsung 14 S. Korea
San'an Optoelectronics 10 China
Seiko Instruments 3 Japan
Semikron 1 EU
Shindengen Electric Manufacturing 2 Asia
Silanna 2 Australia
Silterra Malaysia 1 Malaysia
SiSemi 2 China
SK Hynix 13 S. Korea
Skorpios Technologies 1 USA
SkyWater Technology 1 USA
Skyworks Solutions 5 global
SMIC 10 China
Sony 7 Japan
STAR-C 2 India
STMicroelectronics 9 EU
SUNY Poly CNSE 3 USA
Teledyne 2 USA
Texas Instruments 16 USA
Tower Semiconductor 7 global
Tsinghua Unigroup 3 China
TSMC 40 Taiwan
UMC 12 Taiwan
United Monolithic Semiconductors 2 EU
Vanguard International Semiconductor 3 Taiwan
Voyant Photonics 1 USA
Win Semiconductor 3 Taiwan
Winbond 2 Taiwan
X-Fab 6 EU
Xiamen Jaysun Semiconductor 1 China
Xiyue Electronics Technology 1 China

Process Nodes & Technology Lines

Fabs are typically identified not just by location or operator, but by the process nodes they support. Leading-edge fabs today operate at 5 nm and 3 nm, with roadmaps toward 2 nm and below using GAAFET (gate-all-around) transistor structures. Legacy fabs (65 nm, 90 nm, 130 nm) remain vital for automotive, analog, and IoT chips. Advanced logic fabs can run multiple process lines simultaneously, while memory fabs are tuned for DRAM or NAND structures rather than node scaling. Detailed analysis of process nodes and lithography requirements is covered under the Manufacturing > Wafer Fab Equipment section.


Key Considerations

  • Capital Intensity: $15–20B for a new leading-edge fab; $3–7B for a mature-node fab.
  • Geopolitical Exposure: Taiwan fabs account for ~60% of global foundry revenue.
  • Environmental Impact: High power, water, and chemical use raise sustainability challenges.
  • Technology Leadership: Process node capability defines global competitiveness and market share.