Semiconductor Supply Chain Bottlenecks



Rank Bottleneck Area Why It’s Critical in U.S. Context Risk Factors
1 Lithography Equipment (EUV/DUV) U.S. fabs (Intel, Micron, TSMC AZ, Samsung TX) depend entirely on ASML. No domestic capability. 100% foreign dependence (Netherlands), long lead times, export controls.
2 Permitting & Environmental Reviews Federal (NEPA), state, and local approvals often delay fab builds by 2–5 years. Lengthy EIS reviews, lawsuits, local resistance (NIMBY).
3 High-Purity Silicon Wafers U.S. imports nearly all 300mm wafers (Japan, Germany, Taiwan). Import dependence, purity requirements, slow ramp-up.
4 Specialty Gases (Neon, Fluorine, Argon) No large-scale U.S. neon purification; imports dominate. Ukraine/Russia disruptions, purity constraints, limited stockpiles.
5 Advanced Packaging (CoWoS, HBM stacking, Foveros) U.S. lags; almost all advanced packaging is in Taiwan, Korea, Singapore. Critical for AI/GPUs; U.S. programs years away.
6 Substrate Materials (ABF, Ajinomoto Film) 100% import-dependent from Japan. Supply/demand crunch, no U.S. suppliers.
7* Power Availability & Grid Interconnection Fabs need 100–400 MW each; grid tie-ins take years. Grid congestion, long transmission permitting, competition with AI datacenters & EV gigafactories.
8 Water Access & Rights Fabs need 2–5M gallons/day of ultrapure water. Drought in AZ/TX, water rights disputes, costly treatment infrastructure.
9 Critical Minerals (Gallium, Germanium, Rare Earths, SiC, GaN) U.S. has ore but little refining; China dominates processing. Export bans, permitting delays for mines, slow refining build-out.
10 Workforce (Fab Technicians & Engineers) Severe shortage of skilled labor; fabs coming online faster than talent pipeline. 10+ year training lag, immigration barriers, housing shortages.

* - #7 position if microgrids + onsite DER are used in conjunction with grid tie-in.