Market
Wet Chemicals Are a $6.3 Billion Market Sold on Purity
Commodity molecules refined to parts-per-trillion, plus specialty precursors made in small batches.
| Measure | Figure | Source |
|---|---|---|
| Wet chemicals and specialty cleans, 2026 | About $6.3B, up 9.9% | TechInsights (TECHCET), May 2026 |
| Wet chemicals growth, 2025 to 2030 | 7.2% a year | TechInsights (TECHCET), May 2026 |
| ALD and CVD precursors, 2024 | About $1.9B; about 8% growth expected for 2025 | TECHCET via Semiconductor Digest, May 2025 |
| Korea hydrogen fluoride imports | $36.3M (2019) to $12.5M (2021) | MOTIE via ETNews |
Process chemicals split into two businesses. Wet chemicals are commodity molecules, sulfuric acid, hydrogen peroxide, ammonia, HF, IPA, refined to parts-per-trillion metal content and shipped in dedicated containers. Precursors are specialty molecules, many made in kilogram batches, that carry hafnium, zirconium, cobalt, ruthenium or molybdenum into deposition tools. Purity, not chemistry, is what limits the supplier list: advanced-node grades need impurity detection below 0.1 parts per trillion.
The HF lesson
Korea Replaced Japanese Hydrogen Fluoride in About a Year
On July 4, 2019, Japan moved high-purity hydrogen fluoride, photoresist and fluorinated polyimide exports to South Korea onto case-by-case licensing. Samsung and SK hynix relied heavily on Japanese HF from makers such as Stella Chemifa and Morita. Korea answered by qualifying its own: Soulbrain supplied high-purity HF to Samsung from January 2020, and SK Materials, RAM Technology and ENF Technology followed. Korea's HF imports fell 66% in two years. Japan lifted the curbs in March 2023 and Korea withdrew its WTO complaint.
The episode set the template for chemical risk in chipmaking. A commodity chemical can be a chokepoint when a few plants hold the purity qualifications, and requalifying a new source takes months of yield checks, but it can be done in about a year when the customer is large enough to pay for it.
Where they are used
Every Step and Every Layer Uses Chemicals
Chemicals enter at every step and the flow repeats for every layer, so a leading-edge wafer passes through cleaning chemistry hundreds of times. The steps themselves are on Wafer Cleaning, Thin-Film Deposition and Etching.
Chemical by chemical
Nine Chemical Groups Do Most of the Work
| Chemical | Use | Leading suppliers | Risk |
|---|---|---|---|
| Hydrofluoric acid (HF) | Oxide removal, wet etch, surface prep | Stella Chemifa, Morita (Japan); Soulbrain, SK Materials (Korea); Honeywell; Chinese makers | High: few ultra-pure plants; fluorine handling |
| Sulfuric acid | Piranha clean, resist strip; the largest wet chemical by volume | BASF, Kanto Chemical, KPCT | Low to moderate |
| Hydrogen peroxide | Oxidizer in SC-1, SC-2 and piranha | Solvay, Mitsubishi Gas Chemical, Evonik, Chang Chun | Low to moderate |
| Ammonium hydroxide, HCl | SC-1 and SC-2 cleans | BASF, Kanto Chemical, Stella Chemifa | Low |
| IPA | Wafer drying | Entegris, BASF, Tokuyama | Low to moderate |
| TMAH developer | Develops positive-tone resist; MEMS silicon etch | SACHEM (Austin, TX), Tokuyama, Chang Chun | Moderate: acute toxicity |
| PGMEA, NMP | Resist solvent; strip solvent | Dow, BASF, Mitsubishi Chemical | Moderate: NMP restricted under EU REACH |
| High-k and metal precursors | Hafnium, zirconium, aluminum, cobalt, ruthenium, molybdenum films by ALD and CVD | Merck (EMD Electronics), Entegris, Air Liquide, SK Trichem, DNF, Adeka | Moderate to high: new metals, few makers |
| TEOS, TCS | Oxide deposition; silicon epitaxy | Evonik, Merck, Wacker, Tokuyama | Low to moderate |
Suppliers
German, Japanese and Korean Groups Supply Most Fab Chemicals
- Made in US
- Some US volume
- US planned
- Made abroad
| Company | Headquarters | Supplies | Note | US status |
|---|---|---|---|---|
| BASF | Ludwigshafen, Germany | Wet chemicals: acids, ammonia, solvents | Broadest wet chemical line | Some US volume |
| Merck KGaA (EMD Electronics) | Darmstadt, Germany | Precursors, specialty gases, delivery systems (ex-Versum) | Largest precursor maker | Some US volume |
| Entegris | Billerica, MA | Precursors, IPA, specialty cleans, slurries (ex-CMC), filters | Colorado Springs plant opened 2025 | Made in US |
| Stella Chemifa | Osaka, Japan | Ultra-pure HF and fluorides | Leading semiconductor-grade HF | Made abroad |
| Kanto Chemical | Tokyo, Japan | Wet chemicals; KPCT sulfuric acid JV with Chemtrade | Casa Grande, AZ plant announced 2022 | US planned |
| Chang Chun Group | Taipei, Taiwan | H2O2, TMAH developer, plating chemicals | $300M Casa Grande, AZ plant, groundbreaking 2022 | US planned |
| Solvay | Brussels, Belgium | Electronic-grade H2O2 | Casa Grande, AZ plant announced 2022 | US planned |
| SACHEM | Austin, TX | TMAH developer and quaternary ammonium chemicals | US-based developer maker | Made in US |
| Soulbrain | Seongnam, South Korea | HF, etchants, precursors | Korea's localization leader after 2019 | Made abroad |
Wet chemicals come from German, Japanese, Korean and Taiwanese chemical groups that run ultra-pure lines next to the fab clusters they serve. Precursors are concentrated in Merck, Entegris and Air Liquide, with Korean and Japanese specialists for memory fabs. The Casa Grande plants are marked planned because their production status has not been confirmed since their announcements.
US supply
Arizona's Fabs Pulled a Chemical Cluster After Them
Arizona's fab cluster pulled a chemical cluster after it. In Casa Grande, Chang Chun is building a $300M plant for electronic-grade hydrogen peroxide, TMAH developer and plating chemicals, Solvay an electronic-grade hydrogen peroxide plant, and KPCT, the Kanto-Chemtrade joint venture, an ultra-pure sulfuric acid plant, all announced in 2022 to supply Arizona's fabs, including TSMC Arizona. Entegris opened a Colorado Springs plant in 2025 for filters, purification products and wafer carriers.
PFAS
The EU's PFAS Restriction Reaches Into Resist, Seals and Etch Gases
Per- and polyfluoroalkyl substances (PFAS) run through chipmaking: in photoacid generators and surfactants in resist, in fluoropolymer pipes, valves and seals, and in several etch gases. In January 2023 Denmark, Germany, the Netherlands, Norway and Sweden proposed an EU-wide restriction on the whole class. ECHA's risk committee adopted its final opinion on March 2, 2026, and its socio-economic committee aims for its final opinion by the end of 2026, after which the European Commission drafts the law. Electronics and semiconductors drew the most industry comments, 12.7%. 3M, a major fluorochemical maker, said in 2022 it would exit PFAS manufacturing by the end of 2025.
Resist makers are developing PFAS-free photoacid generators, but no fully equivalent substitutes exist for some uses, so the industry is asking for time-limited derogations.
China
China Makes Its Own Bulk Chemicals but Not Its Specialty Grades
China makes most of its own commodity wet chemicals, and its makers of hydrofluoric acid, sulfuric acid and hydrogen peroxide are moving into the higher purity grades. The gaps are at the specialty end: advanced resists, high-k and metal precursors and post-CMP cleans still come mostly from Japanese, German, US and Korean suppliers. Upstream, China is the largest fluorspar miner, which gives it a hand in the fluorine chain behind HF and the fluorinated gases.
Dataset
The Process Chemicals Dataset
SemiconductorX tracks 223 chemicals used in chipmaking. The edited table above covers the nine groups that do most of the work; the full dataset is below.
Show all 223 process chemicals SemiconductorX chemicals table
| Chemical |
|---|
| (L)-Ethyl lactate |
| 1,1,1-Trichloroethane |
| 1,2-Dichloroethylene, all isomers |
| 1-Methoxy-2-propyl acetate |
| 1-Nitropropane |
| 2,2,6,6-Tetrabromobisphenol A |
| 2,4,6,8-Tetramethylcyclotetrasiloxane |
| 2-Butanone |
| 2-Butoxyethanol |
| 2-Ethoxyethanol |
| 2-Ethoxyethyl acetate |
| 2-Methoxyethanol |
| 2-Methylimidazole |
| 4-Chloro-2-methylphenol |
| Acetic acid |
| Acetone |
| Acetonitrile |
| Alloy 42 |
| Aluminum |
| Aluminum nitride |
| Aluminum phosphide |
| Aluminum tris(8-hydroxyquinoline) |
| Ammonia |
| Ammonium fluoride |
| Ammonium hydroxide |
| Ammonium persulfate |
| Anatase |
| Antimony |
| Antimony trichloride |
| Antimony trioxide |
| Argon |
| Arsenic |
| Arsenic pentafluoride |
| Arsenic trioxide |
| Arsenic trisulfide |
| Arsine |
| Bis(dimethylamino)dimethylsilane |
| Bismuth |
| Bismuth telluride |
| Bisphenol A |
| Boron |
| Boron nitride |
| Boron oxide |
| Boron tribromide |
| Boron trichloride |
| Boron trifluoride |
| Borophosphosilicate glass |
| Cadmium |
| Cadmium oxide |
| Cadmium selenide |
| Cadmium sulfide |
| Cadmium telluride |
| Carbon tetrachloride |
| Chromium |
| Chromium trioxide |
| Chromium(III) oxide |
| Cobalt |
| Cobaltic-cobaltous oxide |
| Cobaltous oxide |
| Colophony |
| Copper |
| Copper indium gallium selenide (CIGS) |
| Copper(II) oxide |
| Copper(II) sulfate |
| Cupric sulfide |
| Cuprous selenide |
| Cyclohexyl methacrylate |
| Decaborane |
| Diborane |
| Dichlorosilane |
| Diethanolamine |
| Diethyl oxalate |
| Diethylene glycol dimethyl ether |
| Diethylene glycol monobutyl ether |
| Diethylsilane |
| Dimethyl acetamide |
| Dimethyl sulfoxide |
| Dimethylamine borane |
| Dimethylformamide |
| Dodecyl and tetradecyl glycidyl ethers |
| Epichlorohydrin |
| Ethanolamine |
| Ethyl lactate |
| Ethyl silicate |
| Ethyl-3-ethoxypropionate |
| Formaldehyde |
| Gallium |
| Gallium arsenide |
| Gallium manganese arsenide (GaMnAs) |
| Gallium nitride |
| Gallium oxide |
| Gallium phosphide |
| Gallium trichloride |
| Germanium |
| Germanium dioxide |
| Germanium telluride |
| Germanium tetrachloride |
| Germanium tetrafluoride |
| Germanium tetrahydride |
| Gold |
| Hafnium |
| Hafnium tetrachloride |
| Helium |
| Hexachlorodisilane |
| Hexafluorobutadiene |
| Hexamethyldisilazane |
| Hydrazine |
| Hydrogen chloride |
| Hydrogen fluoride |
| Hydrogen peroxide |
| Hydrogen selenide |
| Indium |
| Indium arsenide |
| Indium nitride |
| Indium phosphide |
| Isopropyl alcohol |
| Kovar |
| Lead |
| Lead titanate |
| Lead zirconate titanate |
| Lead(II) sulfide |
| Lead(II) telluride |
| Manganese(II) oxide |
| Manganese(III) oxide |
| Melamine |
| Mercuric telluride |
| Mercury(II) selenide |
| Methyl alcohol |
| Methyl cellosolve acetate |
| Methyl formate |
| Methylchloro-isothiazolinone |
| Molybdenum disilicide |
| Molybdenum disulfide |
| N-(2-Hydroxyethyl)ethylenediamine |
| n-Butyl acetate |
| n-Butyl alcohol |
| N-Methyl-2-pyrrolidone |
| Nickel |
| Nickel carbonyl |
| Nickel(II) oxide |
| Nitric acid |
| Nitrobenzene |
| Nitrogen trifluoride |
| Octamethyltrisiloxane |
| Oxirane |
| Pentaborane |
| Pentaerythritol triacrylate |
| Perfluoro compounds, C5-18 |
| Perfluoroisobutylene |
| Perfluorooctane sulfonic acid |
| Perfluorotributylamine |
| Perylene |
| Phenol |
| Phenol-formaldehyde resin |
| Phosphine |
| Phosphoric acid |
| Phosphorus (yellow) |
| Phosphorus oxychloride |
| Phosphorus pentafluoride |
| Phosphorus pentoxide |
| Phosphorus tribromide |
| Phosphorus trichloride |
| Platinum silicate |
| Platinum, soluble salts |
| Polysilicon |
| Potassium hydroxide |
| Propargyl alcohol |
| Quartz |
| Rhenium |
| Rubidium |
| Sapphire |
| Scandium |
| Scandium nitride |
| Selenium hexafluoride |
| Selenourea |
| Sichrome |
| Silica, amorphous |
| Silicic acid |
| Silicon |
| Silicon carbide (SiC) |
| Silicon dioxide |
| Silicon nitride |
| Silicon tetrachloride |
| Silicon tetrahydride |
| Silver |
| Sodium hydroxide |
| Stibine |
| Stoddard solvent |
| Strontium titanate |
| Sulfolane |
| Sulfuric acid |
| Tellurium |
| tert-Butylarsine |
| Tetrafluoroboric acid |
| Tetrakis(dimethylamino)titanium (TDMAT) |
| Tetrakis(ethylmethylamino)hafnium (TEMAH) |
| Tetramethyl ammonium hydroxide |
| Tetramethylsilane |
| Thallium |
| Thallium selenide |
| Tin |
| Tin(II) oxide |
| Tin(IV) oxide |
| Titanium dioxide |
| Titanium nitride |
| Toluene |
| Trichlorosilane |
| Triethyl borate |
| Triethylindium |
| Trifluoro(tetrahydrofuran)boron |
| Trimellitic anhydride |
| Trimethylaluminum |
| Trimethylborane |
| Trimethylgallium |
| Trimethylindium |
| Tungsten |
| Tungsten hexafluoride |
| Vinyltrimethylsilane |
| Xylene isomers |
| Zinc chloride fume |
| Zinc oxide |
| Zinc telluride |
| Zirconium boride |
Record
Page Record
- Covers
- Wet chemical and precursor market, the 2019 Japan-Korea hydrogen fluoride curbs, chemicals by fab step, suppliers, US chemical plants, the EU PFAS restriction, China. Folded in: Semiconductor Critical Chemicals
- Sources
- TechInsights (TECHCET) wet chemicals and specialty cleans market, May 14, 2026; TECHCET via Semiconductor Digest, ALD and CVD precursors (May 2, 2025); ETNews citing MOTIE (December 2022); Asia News Network and Korea Times on the March 2023 lifting; ChemRadar on ECHA's PFAS consultation (June 2026); AZ Big Media on Chang Chun Arizona (October 2022); Arizona Commerce Authority on Solvay and KPCT (2022); Entegris release on Colorado Springs (November 2025); arXiv 2509.18768 on purity tiers
- Last verified
- October 2026