Semiconductor Process Chemicals

Materials · wet chemicals and precursors · BASF, Merck, Entegris, Stella Chemifa, Soulbrain, Chang Chun

Fab chemicals are commodity molecules made to parts-per-trillion purity, so a few plants hold the qualifications. When Japan licensed hydrogen fluoride exports to Korea in July 2019, Korea's HF imports fell 66% in two years as Soulbrain and SK Materials qualified their own; the next test is the EU's PFAS restriction, due its final committee opinion by the end of 2026.

In July 2019 Japan put licensing on exports of high-purity hydrogen fluoride, photoresist and fluorinated polyimide to South Korea. Korea's hydrogen fluoride imports fell 66%, from $36.3 million in 2019 to $12.5 million in 2021, as Soulbrain, SK Materials, RAM Technology and ENF Technology qualified their own. Japan lifted the curbs in March 2023. Wet chemicals and specialty cleans are forecast at about $6.3 billion in 2026, up 9.9%. SOUTH KOREA HYDROGEN FLUORIDE IMPORTS MILLION DOLLARS, MOTIE $36.3M 2019 $12.5M 2021 -66% IN TWO YEARS AS KOREA QUALIFIED ITS OWN HF Jul 2019 JAPAN LICENSES HF, RESIST, POLYIMIDE EXPORTS TO KOREA Jan 2020 SOULBRAIN HIGH-PURITY HF SUPPLIES SAMSUNG Mar 2023 JAPAN LIFTS THE CURBS; KOREA DROPS WTO CASE End 2026 EU PFAS RESTRICTION: FINAL COMMITTEE OPINION DUE SOURCES: ETNEWS CITING MOTIE (DEC 2022); ECHA VIA CHEMRADAR (2026).
Wet chemicals, 2026
~$6.3B
Growth, 2026
+9.9%
Precursors, 2024
~$1.9B
Korea HF imports
-66%
EU PFAS
Opinion due 2026
Hub
Materials

Market

Wet Chemicals Are a $6.3 Billion Market Sold on Purity

Commodity molecules refined to parts-per-trillion, plus specialty precursors made in small batches.

Process chemical market markers
MeasureFigureSource
Wet chemicals and specialty cleans, 2026About $6.3B, up 9.9%TechInsights (TECHCET), May 2026
Wet chemicals growth, 2025 to 20307.2% a yearTechInsights (TECHCET), May 2026
ALD and CVD precursors, 2024About $1.9B; about 8% growth expected for 2025TECHCET via Semiconductor Digest, May 2025
Korea hydrogen fluoride imports$36.3M (2019) to $12.5M (2021)MOTIE via ETNews

Process chemicals split into two businesses. Wet chemicals are commodity molecules, sulfuric acid, hydrogen peroxide, ammonia, HF, IPA, refined to parts-per-trillion metal content and shipped in dedicated containers. Precursors are specialty molecules, many made in kilogram batches, that carry hafnium, zirconium, cobalt, ruthenium or molybdenum into deposition tools. Purity, not chemistry, is what limits the supplier list: advanced-node grades need impurity detection below 0.1 parts per trillion.

The HF lesson

Korea Replaced Japanese Hydrogen Fluoride in About a Year

On July 4, 2019, Japan moved high-purity hydrogen fluoride, photoresist and fluorinated polyimide exports to South Korea onto case-by-case licensing. Samsung and SK hynix relied heavily on Japanese HF from makers such as Stella Chemifa and Morita. Korea answered by qualifying its own: Soulbrain supplied high-purity HF to Samsung from January 2020, and SK Materials, RAM Technology and ENF Technology followed. Korea's HF imports fell 66% in two years. Japan lifted the curbs in March 2023 and Korea withdrew its WTO complaint.

The episode set the template for chemical risk in chipmaking. A commodity chemical can be a chokepoint when a few plants hold the purity qualifications, and requalifying a new source takes months of yield checks, but it can be done in about a year when the customer is large enough to pay for it.

Where they are used

Every Step and Every Layer Uses Chemicals

Where chemicals enter the wafer flow. Cleaning uses SC-1, SC-2, piranha and dilute hydrofluoric acid with isopropyl alcohol drying. Patterning uses photoresist, PGMEA solvent, HMDS primer, anti-reflective coatings and TMAH developer. Deposition uses liquid and solid precursors such as TEOS, TMA and hafnium compounds. Etch and strip use buffered HF, hot phosphoric acid and solvent strippers. Planarization uses silica, ceria and alumina slurries. Plating and packaging use copper baths, mold compound and underfill. The loop repeats for every layer. WHERE CHEMICALS ENTER THE WAFER FLOW Clean SC-1 (NH4OH, H2O2), SC-2 (HCL, H2O2), PIRANHA (H2SO4), DILUTE HF, IPA Pattern PHOTORESIST, PGMEA SOLVENT, HMDS PRIMER, BARC, TMAH 2.38% DEVELOPER Deposit TEOS, TMA, HAFNIUM AND ZIRCONIUM PRECURSORS, TIN, COBALT, RUTHENIUM, WF6, TCS Etch and strip BUFFERED HF, HOT PHOSPHORIC ACID, NITRIC BLENDS, NMP, RESIDUE REMOVERS Planarize SILICA, CERIA AND ALUMINA SLURRIES, POST-CMP CLEANS Plate and package COPPER PLATING BATHS, ADDITIVES, MOLD COMPOUND, UNDERFILL SCHEMATIC. THE LOOP REPEATS FOR EVERY LAYER; PHOTORESIST AND SLURRIES HAVE THEIR OWN PAGES.

Chemicals enter at every step and the flow repeats for every layer, so a leading-edge wafer passes through cleaning chemistry hundreds of times. The steps themselves are on Wafer Cleaning, Thin-Film Deposition and Etching.

Chemical by chemical

Nine Chemical Groups Do Most of the Work

Main process chemicals
ChemicalUseLeading suppliersRisk
Hydrofluoric acid (HF)Oxide removal, wet etch, surface prepStella Chemifa, Morita (Japan); Soulbrain, SK Materials (Korea); Honeywell; Chinese makersHigh: few ultra-pure plants; fluorine handling
Sulfuric acidPiranha clean, resist strip; the largest wet chemical by volumeBASF, Kanto Chemical, KPCTLow to moderate
Hydrogen peroxideOxidizer in SC-1, SC-2 and piranhaSolvay, Mitsubishi Gas Chemical, Evonik, Chang ChunLow to moderate
Ammonium hydroxide, HClSC-1 and SC-2 cleansBASF, Kanto Chemical, Stella ChemifaLow
IPAWafer dryingEntegris, BASF, TokuyamaLow to moderate
TMAH developerDevelops positive-tone resist; MEMS silicon etchSACHEM (Austin, TX), Tokuyama, Chang ChunModerate: acute toxicity
PGMEA, NMPResist solvent; strip solventDow, BASF, Mitsubishi ChemicalModerate: NMP restricted under EU REACH
High-k and metal precursorsHafnium, zirconium, aluminum, cobalt, ruthenium, molybdenum films by ALD and CVDMerck (EMD Electronics), Entegris, Air Liquide, SK Trichem, DNF, AdekaModerate to high: new metals, few makers
TEOS, TCSOxide deposition; silicon epitaxyEvonik, Merck, Wacker, TokuyamaLow to moderate

Suppliers

German, Japanese and Korean Groups Supply Most Fab Chemicals

  • Made in US
  • Some US volume
  • US planned
  • Made abroad
Process chemical suppliers
CompanyHeadquartersSuppliesNoteUS status
BASFLudwigshafen, GermanyWet chemicals: acids, ammonia, solventsBroadest wet chemical lineSome US volume
Merck KGaA (EMD Electronics)Darmstadt, GermanyPrecursors, specialty gases, delivery systems (ex-Versum)Largest precursor makerSome US volume
EntegrisBillerica, MAPrecursors, IPA, specialty cleans, slurries (ex-CMC), filtersColorado Springs plant opened 2025Made in US
Stella ChemifaOsaka, JapanUltra-pure HF and fluoridesLeading semiconductor-grade HFMade abroad
Kanto ChemicalTokyo, JapanWet chemicals; KPCT sulfuric acid JV with ChemtradeCasa Grande, AZ plant announced 2022US planned
Chang Chun GroupTaipei, TaiwanH2O2, TMAH developer, plating chemicals$300M Casa Grande, AZ plant, groundbreaking 2022US planned
SolvayBrussels, BelgiumElectronic-grade H2O2Casa Grande, AZ plant announced 2022US planned
SACHEMAustin, TXTMAH developer and quaternary ammonium chemicalsUS-based developer makerMade in US
SoulbrainSeongnam, South KoreaHF, etchants, precursorsKorea's localization leader after 2019Made abroad

Wet chemicals come from German, Japanese, Korean and Taiwanese chemical groups that run ultra-pure lines next to the fab clusters they serve. Precursors are concentrated in Merck, Entegris and Air Liquide, with Korean and Japanese specialists for memory fabs. The Casa Grande plants are marked planned because their production status has not been confirmed since their announcements.

US supply

Arizona's Fabs Pulled a Chemical Cluster After Them

Arizona's fab cluster pulled a chemical cluster after it. In Casa Grande, Chang Chun is building a $300M plant for electronic-grade hydrogen peroxide, TMAH developer and plating chemicals, Solvay an electronic-grade hydrogen peroxide plant, and KPCT, the Kanto-Chemtrade joint venture, an ultra-pure sulfuric acid plant, all announced in 2022 to supply Arizona's fabs, including TSMC Arizona. Entegris opened a Colorado Springs plant in 2025 for filters, purification products and wafer carriers.

PFAS

The EU's PFAS Restriction Reaches Into Resist, Seals and Etch Gases

Per- and polyfluoroalkyl substances (PFAS) run through chipmaking: in photoacid generators and surfactants in resist, in fluoropolymer pipes, valves and seals, and in several etch gases. In January 2023 Denmark, Germany, the Netherlands, Norway and Sweden proposed an EU-wide restriction on the whole class. ECHA's risk committee adopted its final opinion on March 2, 2026, and its socio-economic committee aims for its final opinion by the end of 2026, after which the European Commission drafts the law. Electronics and semiconductors drew the most industry comments, 12.7%. 3M, a major fluorochemical maker, said in 2022 it would exit PFAS manufacturing by the end of 2025.

Resist makers are developing PFAS-free photoacid generators, but no fully equivalent substitutes exist for some uses, so the industry is asking for time-limited derogations.

China

China Makes Its Own Bulk Chemicals but Not Its Specialty Grades

China makes most of its own commodity wet chemicals, and its makers of hydrofluoric acid, sulfuric acid and hydrogen peroxide are moving into the higher purity grades. The gaps are at the specialty end: advanced resists, high-k and metal precursors and post-CMP cleans still come mostly from Japanese, German, US and Korean suppliers. Upstream, China is the largest fluorspar miner, which gives it a hand in the fluorine chain behind HF and the fluorinated gases.

Dataset

The Process Chemicals Dataset

SemiconductorX tracks 223 chemicals used in chipmaking. The edited table above covers the nine groups that do most of the work; the full dataset is below.

Show all 223 process chemicals SemiconductorX chemicals table
Process Chemicals dataset
Chemical
(L)-Ethyl lactate
1,1,1-Trichloroethane
1,2-Dichloroethylene, all isomers
1-Methoxy-2-propyl acetate
1-Nitropropane
2,2,6,6-Tetrabromobisphenol A
2,4,6,8-Tetramethylcyclotetrasiloxane
2-Butanone
2-Butoxyethanol
2-Ethoxyethanol
2-Ethoxyethyl acetate
2-Methoxyethanol
2-Methylimidazole
4-Chloro-2-methylphenol
Acetic acid
Acetone
Acetonitrile
Alloy 42
Aluminum
Aluminum nitride
Aluminum phosphide
Aluminum tris(8-hydroxyquinoline)
Ammonia
Ammonium fluoride
Ammonium hydroxide
Ammonium persulfate
Anatase
Antimony
Antimony trichloride
Antimony trioxide
Argon
Arsenic
Arsenic pentafluoride
Arsenic trioxide
Arsenic trisulfide
Arsine
Bis(dimethylamino)dimethylsilane
Bismuth
Bismuth telluride
Bisphenol A
Boron
Boron nitride
Boron oxide
Boron tribromide
Boron trichloride
Boron trifluoride
Borophosphosilicate glass
Cadmium
Cadmium oxide
Cadmium selenide
Cadmium sulfide
Cadmium telluride
Carbon tetrachloride
Chromium
Chromium trioxide
Chromium(III) oxide
Cobalt
Cobaltic-cobaltous oxide
Cobaltous oxide
Colophony
Copper
Copper indium gallium selenide (CIGS)
Copper(II) oxide
Copper(II) sulfate
Cupric sulfide
Cuprous selenide
Cyclohexyl methacrylate
Decaborane
Diborane
Dichlorosilane
Diethanolamine
Diethyl oxalate
Diethylene glycol dimethyl ether
Diethylene glycol monobutyl ether
Diethylsilane
Dimethyl acetamide
Dimethyl sulfoxide
Dimethylamine borane
Dimethylformamide
Dodecyl and tetradecyl glycidyl ethers
Epichlorohydrin
Ethanolamine
Ethyl lactate
Ethyl silicate
Ethyl-3-ethoxypropionate
Formaldehyde
Gallium
Gallium arsenide
Gallium manganese arsenide (GaMnAs)
Gallium nitride
Gallium oxide
Gallium phosphide
Gallium trichloride
Germanium
Germanium dioxide
Germanium telluride
Germanium tetrachloride
Germanium tetrafluoride
Germanium tetrahydride
Gold
Hafnium
Hafnium tetrachloride
Helium
Hexachlorodisilane
Hexafluorobutadiene
Hexamethyldisilazane
Hydrazine
Hydrogen chloride
Hydrogen fluoride
Hydrogen peroxide
Hydrogen selenide
Indium
Indium arsenide
Indium nitride
Indium phosphide
Isopropyl alcohol
Kovar
Lead
Lead titanate
Lead zirconate titanate
Lead(II) sulfide
Lead(II) telluride
Manganese(II) oxide
Manganese(III) oxide
Melamine
Mercuric telluride
Mercury(II) selenide
Methyl alcohol
Methyl cellosolve acetate
Methyl formate
Methylchloro-isothiazolinone
Molybdenum disilicide
Molybdenum disulfide
N-(2-Hydroxyethyl)ethylenediamine
n-Butyl acetate
n-Butyl alcohol
N-Methyl-2-pyrrolidone
Nickel
Nickel carbonyl
Nickel(II) oxide
Nitric acid
Nitrobenzene
Nitrogen trifluoride
Octamethyltrisiloxane
Oxirane
Pentaborane
Pentaerythritol triacrylate
Perfluoro compounds, C5-18
Perfluoroisobutylene
Perfluorooctane sulfonic acid
Perfluorotributylamine
Perylene
Phenol
Phenol-formaldehyde resin
Phosphine
Phosphoric acid
Phosphorus (yellow)
Phosphorus oxychloride
Phosphorus pentafluoride
Phosphorus pentoxide
Phosphorus tribromide
Phosphorus trichloride
Platinum silicate
Platinum, soluble salts
Polysilicon
Potassium hydroxide
Propargyl alcohol
Quartz
Rhenium
Rubidium
Sapphire
Scandium
Scandium nitride
Selenium hexafluoride
Selenourea
Sichrome
Silica, amorphous
Silicic acid
Silicon
Silicon carbide (SiC)
Silicon dioxide
Silicon nitride
Silicon tetrachloride
Silicon tetrahydride
Silver
Sodium hydroxide
Stibine
Stoddard solvent
Strontium titanate
Sulfolane
Sulfuric acid
Tellurium
tert-Butylarsine
Tetrafluoroboric acid
Tetrakis(dimethylamino)titanium (TDMAT)
Tetrakis(ethylmethylamino)hafnium (TEMAH)
Tetramethyl ammonium hydroxide
Tetramethylsilane
Thallium
Thallium selenide
Tin
Tin(II) oxide
Tin(IV) oxide
Titanium dioxide
Titanium nitride
Toluene
Trichlorosilane
Triethyl borate
Triethylindium
Trifluoro(tetrahydrofuran)boron
Trimellitic anhydride
Trimethylaluminum
Trimethylborane
Trimethylgallium
Trimethylindium
Tungsten
Tungsten hexafluoride
Vinyltrimethylsilane
Xylene isomers
Zinc chloride fume
Zinc oxide
Zinc telluride
Zirconium boride

Record

Page Record

Covers
Wet chemical and precursor market, the 2019 Japan-Korea hydrogen fluoride curbs, chemicals by fab step, suppliers, US chemical plants, the EU PFAS restriction, China. Folded in: Semiconductor Critical Chemicals
Sources
TechInsights (TECHCET) wet chemicals and specialty cleans market, May 14, 2026; TECHCET via Semiconductor Digest, ALD and CVD precursors (May 2, 2025); ETNews citing MOTIE (December 2022); Asia News Network and Korea Times on the March 2023 lifting; ChemRadar on ECHA's PFAS consultation (June 2026); AZ Big Media on Chang Chun Arizona (October 2022); Arizona Commerce Authority on Solvay and KPCT (2022); Entegris release on Colorado Springs (November 2025); arXiv 2509.18768 on purity tiers
Last verified
October 2026